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BJL CLASSMARK
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KDL, Scarborough
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SUBJECTS (1-4 of 4)
Chemical Processes Computer Simulation
1
Mark
Chemical process simulation and the Aspen HYSYS v8.3 software
Hanyak, Michael Edward, author.
Lewisburg, Philadelphia : Department of Chemical Engineering, Bucknell University, 2013.
2013
BOOK
LOCATION
SHELVED AT
LOAN TYPE
STATUS
BJL Reading Room 1st floor HDC
TP 155.7 H2
4 WEEK LOAN
AVAILABLE
BJL Reading Room 1st floor HDC
TP 155.7 H2
4 WEEK LOAN
AVAILABLE
BJL Reading Room 1st floor HDC
TP 155.7 H2
4 WEEK LOAN
DUE 22-04-24
Click to view copies/volumes at all libraries
2
Mark
HYSYS software for chemical and petroleum engineering
Saadi Ibrahem, Ahmmed, author.
Saarbrücken : Lap Lambert Academic Publishing, 2014.
2014
BOOK
LOCATION
SHELVED AT
LOAN TYPE
STATUS
BJL Reading Room 1st floor HDC
TP 155.7 S1
4 WEEK LOAN
DUE 22-04-24
BJL Reading Room 1st floor HDC
TP 155.7 S1
4 WEEK LOAN
AVAILABLE
BJL Reading Room 1st floor HDC
TP 155.7 S1
4 WEEK LOAN
AVAILABLE
Click to view copies/volumes at all libraries
3
Mark
Process modelling and model analysis
Hangos, K. M. (Katalin M.)
London : Academic Press, c2001.
c2001
BOOK
LOCATION
SHELVED AT
LOAN TYPE
STATUS
BJL 3rd Floor
TP 155.7 H2
8 WEEK LOAN
AVAILABLE
BJL 3rd Floor
TP 155.7 H2
8 WEEK LOAN
AVAILABLE
BJL 3rd Floor
TP 155.7 H2
8 WEEK LOAN
AVAILABLE
4
Mark
Teach yourself the basics of Aspen plus
Schefflan, Ralph.
Hoboken, N.J. : Wiley ; [New York] : American Institute of Chemical Engineers, c2011.
c2011
BOOK
LOCATION
SHELVED AT
LOAN TYPE
STATUS
BJL 3rd Floor
TP 155.7 S3
8 WEEK LOAN
AVAILABLE
BJL 3rd Floor
TP 155.7 S3
8 WEEK LOAN
AVAILABLE
BJL 3rd Floor
TP 155.7 S3
8 WEEK LOAN
AVAILABLE