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Author Hanyak, Michael Edward, author.
Title Chemical process simulation and the Aspen HYSYS v8.3 software / Michael E. Hanyak.
Publisher Lewisburg, Philadelphia : Department of Chemical Engineering, Bucknell University, 2013.


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 BJL Reading Room 1st floor HDC  TP 155.7 H2  4 WEEK LOAN  AVAILABLE
 BJL Reading Room 1st floor HDC  TP 155.7 H2  4 WEEK LOAN  AVAILABLE
 BJL Reading Room 1st floor HDC  TP 155.7 H2  4 WEEK LOAN  DUE 20-05-24
 BJL Reading Room 1st floor HDC  TP 155.7 H2  4 WEEK LOAN  AVAILABLE
 BJL Reading Room 1st floor HDC  TP 155.7 H2  4 WEEK LOAN  AVAILABLE
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Descript 1 volume (various pagings)
Content text
Media unmediated
Carrier volume
Note This document entitled Chemical Process Simulation and the Aspen HYSYS v8.3 Software, is a self-paced instructional manual that aids students in learning how to use a chemical process simulator and how a process simulator models material balances, phase equilibria, and energy balances for chemical process units.
ISBN 9781493794478
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Author Hanyak, Michael Edward, author.
Subject Chemical processes.
Chemical processes -- Computer simulation.
Chemical processes -- Data processing.
Descript 1 volume (various pagings)
Content text
Media unmediated
Carrier volume
Note This document entitled Chemical Process Simulation and the Aspen HYSYS v8.3 Software, is a self-paced instructional manual that aids students in learning how to use a chemical process simulator and how a process simulator models material balances, phase equilibria, and energy balances for chemical process units.
ISBN 9781493794478
Author Hanyak, Michael Edward, author.
Subject Chemical processes.
Chemical processes -- Computer simulation.
Chemical processes -- Data processing.
LOCATION SHELVED AT LOAN TYPE STATUS
 BJL Reading Room 1st floor HDC  TP 155.7 H2  4 WEEK LOAN  AVAILABLE
 BJL Reading Room 1st floor HDC  TP 155.7 H2  4 WEEK LOAN  AVAILABLE
 BJL Reading Room 1st floor HDC  TP 155.7 H2  4 WEEK LOAN  DUE 20-05-24
 BJL Reading Room 1st floor HDC  TP 155.7 H2  4 WEEK LOAN  AVAILABLE
 BJL Reading Room 1st floor HDC  TP 155.7 H2  4 WEEK LOAN  AVAILABLE

Subject Chemical processes.
Chemical processes -- Computer simulation.
Chemical processes -- Data processing.
Descript 1 volume (various pagings)
Content text
Media unmediated
Carrier volume
Note This document entitled Chemical Process Simulation and the Aspen HYSYS v8.3 Software, is a self-paced instructional manual that aids students in learning how to use a chemical process simulator and how a process simulator models material balances, phase equilibria, and energy balances for chemical process units.
ISBN 9781493794478
Persistent link to this item
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