QC 702.7 I55 I6
4
QC 702.7 I55 N2 : Site characterization and aggregation of implanted atoms in materials / edited by A. Perez and R. Coussement.; BJL
1980
1
QC 702.7 I55 R9 : Ion implantation / H. Ryssel and I. Ruge; translated [from the German] by J.A. Buckman and H. Ryssel.; BJL
1986
1
QC 702.7 I55 T1 : Tables of ion implantation spatial distributions / A.F. Burenkov ... [et al.].; BJL
1986
1
QC 702.7 I55 T7 BJL
1994
1
QC 702.7 N4 C9 : Determination of anions : a guide for the analytical chemist.; BJL
1996
1
QC 702.7 N4 M4 : Negative ions.; BJL
1976
1
QC 711 A2
2
QC 711 B2 : Modern mass spectrometry.; BJL
1
QC 711 B3 : Field ionization mass spectrometry.; BJL
1971
1
QC 711 B5
3
QC 711 C5 : Gaseous electronics and gas lasers.; BJL
1979
1
QC 711 C6 : Gaseous conductors : theory and engineering applications.; BJL
1958
1
QC 711 C8
2
QC 711 C9 : Ions, electrons, and ionizing radiation.; BJL
1955
1
QC 711 D9 : Dynamic mass spectrometry.; BJL
1970
1
QC 711 E3 : Electrical Breakdown of Gases.; BJL
1978
1
QC 711 E5 : The conduction of electricity through gases.; BJL
1951
1
QC 711 I6
4
QC 711 K6 : Introduction to mass spectrometry and its applications.; BJL
1965
1
QC 711 L8 : Fundamental processes of electrical discharge in gases.; BJL
1
QC 711 M1 : Mass spectrometry of organic ions.; Departmental Locations
1963
1
QC 711 M4 : Electrical breakdown of gases.; BJL
1953
1
QC 711 P2 : Electrical phenomena in gases / edited by D.L.Jones.; BJL
1965
1
QC 711 P4 : Electrical discharges in gas.; BJL
1957
1
QC 711 P7 : Plasma source mass spectrometry : developments and applications / edited by Grenville Holland, Scott D. Tanner.; BJL
1997
1
QC 711 R3 : Ion production by electron impact.; Departmental Locations
1962
1
QC 711 R6 : Mass spectrometry.; BJL
1
QC 711 W5 : Gaseous electrical conductors.; BJL
1938
1
QC 711.8 G5 C4 : Glow discharge processes : sputtering and plasma etching.; BJL
1980
1
QC 715 A5 : Photo-electric cells & their applications, a discussion.; BJL
1930
1
QC 715 C1 : Photoelectric cells.; BJL
1
QC 715 F2 : Electric eyes.; BJL
1
QC 715 F8 : Photoelectrets and the electrophotographic process / by V.M.Fridkin and I.S.Zheluda.; BJL
1966
1
QC 715 P5
6
QC 715 S5 : Der lichelektrische effekt und seime Anwendungen bearbeitet und herausgegeben von H.Simon und R.Suhrmann.; BJL
1958
1
QC 715 Z9 : Photocells and their application / by V.K.Zworykin and E.D.Wilson.; BJL
1
QC 715.15 P5 : Photoemission and the electronic properties of surfaces.; BJL
1978
1
QC 715.4 N4 : The physics of solar cells.; BJL
c2003
1
QC 715.4 O6 : Organic solar cells : materials and device physics / Wallace C.H. Choy, editor.; BJL
c2013
1
QC 716.15 S1 : Photoelectron statistics with applications to spectroscopy and optical communication.; BJL
1978
1
QC 717 N2 : The physics of superionic conductors and electrode materials : [proceedings of a NATO Advanced Study Institute... held August 4-22, 1980,, at Odense University, Odense, Denmark] / edited by J.W. Perram.; BJL
1983
1
QC 717.6 I6
4
QC 717.6 S9
2
QC 717.6 T9 : Twenty years of plasma physics : reviews and papers presented at a Workshop commemorating twenty years of programmes in plasma physics, International Centre for Theoretical Physics, Trieste, Italy, September 1984.; BJL
1985
1
QC 717.6 U5 : Plasma physics / edited by C.M. Dewitt and J. Peyrand.; BJL
1975
1
QC 718 B1 : Statistical mechanics of charged particles.; BJL
1963
1
QC 718 B4 : Radiation processes in plasmas.; BJL
1966
1
QC 718 B6 : Plasmas : laboratory and cosmic.; BJL
1966
1
QC 718 B7 : Plasma dynamics / by T.J.M. Boyd and J.J. Sanderson.; BJL
1969
1
