LEADER 00000cam  2200325 a 4500 
001    704522096 
003    UkLCURL 
007    co |g||||||||| 
008    100525s2011    njua     b    001 0 eng   
020    9780470567951|q(pbk.) 
020    0470567953|q(pbk.) 
035    (OCoLC)ocn631744750 
035    (OCoLC)631744750 
035    (StEdNL)4522096 
040    DLC|cDLC|dYDX|dYDXCP|dCDX|dUXS|dNLE 
049    |jCU|k704522096|lo 
050  4 TP 155.7 S3 
082 00 660/.280113|222 
100 1  Schefflan, Ralph. 
245 10 Teach yourself the basics of Aspen plus /|cRalph 
       Schefflan. 
260    Hoboken, N.J. :|bWiley ;|a[New York] :|bAmerican Institute
       of Chemical Engineers,|cc2011. 
300    xv, 216 p. :|bill. ;|c26 cm.  + |e1 CD-ROM. 
500    Includes 1 CD-ROM (4 3/4 in.) 
630 00 Aspen plus. 
650  0 Chemical processes|xComputer simulation. 
650  0 Chemical process control|xComputer programs. 
LOCATION SHELVED AT LOAN TYPE STATUS
 BJL 3rd Floor  TP 155.7 S3  8 WEEK LOAN  AVAILABLE
 BJL 3rd Floor  TP 155.7 S3  8 WEEK LOAN  AVAILABLE
 BJL 3rd Floor  TP 155.7 S3  8 WEEK LOAN  AVAILABLE