LEADER 00000cam 2200325 a 4500 001 704522096 003 UkLCURL 007 co |g||||||||| 008 100525s2011 njua b 001 0 eng 020 9780470567951|q(pbk.) 020 0470567953|q(pbk.) 035 (OCoLC)ocn631744750 035 (OCoLC)631744750 035 (StEdNL)4522096 040 DLC|cDLC|dYDX|dYDXCP|dCDX|dUXS|dNLE 049 |jCU|k704522096|lo 050 4 TP 155.7 S3 082 00 660/.280113|222 100 1 Schefflan, Ralph. 245 10 Teach yourself the basics of Aspen plus /|cRalph Schefflan. 260 Hoboken, N.J. :|bWiley ;|a[New York] :|bAmerican Institute of Chemical Engineers,|cc2011. 300 xv, 216 p. :|bill. ;|c26 cm. + |e1 CD-ROM. 500 Includes 1 CD-ROM (4 3/4 in.) 630 00 Aspen plus. 650 0 Chemical processes|xComputer simulation. 650 0 Chemical process control|xComputer programs.
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